Illumination optics and projection exposure apparatus

ABSTRACT

An illumination optics illuminates an object field of a projection exposure apparatus for microlithography. The illumination optics include a condenser group of optical components which guide a bundle of useful light. An objective group of bundle-guiding components is arranged downstream of the condenser group. At least one component of the condenser group and at least one component of the objective group are displaceable for compensation of deviations of the object field, which is in an actual illumination state, from a desired illumination state.

CROSS-REFERENCE TO RELATED APPLICATIONS

This application is a continuation of, and claims benefit under 35 USC120 to, U.S. application Ser. No. 12/846,470, filed Jul. 29, 2010, nowU.S. Pat. No. 8,705,000, which is a continuation of, and claims benefitunder 35 USC 120 to, international application PCT/EP2008/009914, filedNov. 22, 2008, which claims benefit of German Application No. 10 2008007 449.7, filed Feb. 1, 2008 and USSN 61/025,344, filed Feb. 1, 2008.International application PCT/EP2008/009914 and U.S. application Ser.No. 12/846,470 are hereby incorporated by reference in its entirety.

FIELD

The disclosure relates to an illumination optics, an illumination systemincluding such an illumination optics, a projection exposure apparatusincluding such an illumination system, a method of producing structuredcomponents using such a projection exposure apparatus of this type, anda component produced by such a method.

BACKGROUND

An illumination optics is known from EP 0 940 722 A2 and the documentscited therein. A displaceable lens group is provided in the objectivegroup for influencing the optical aberration of the objective group andfor influencing an intensity distribution of the useful light in theobject field.

DE 10 2006 025 025 A1 discloses an illumination optics including acondenser group and an objective group. The objective group includesdisplaceable optical elements.

U.S. Pat. No. 6,560,044 B2 discloses an illumination optics including acondenser group and an objective group, wherein the condenser groupincludes displaceable optical elements.

U.S. Pat. No. 6,127,095 A describes an illumination optics including acondenser group which includes optical elements that are displaceablealong an optical axis and tiltable relative to the optical axis.

SUMMARY

The disclosure provides an illumination optics configured so that acompensating effect may be exerted on illumination parameters of theobject field illumination. The illumination parameters are in particulardependent on an illumination setting, in other words an illuminationangle distribution.

A pair of optical components, which is displaceable for compensation andwherein one component belongs to the condenser group and one componentbelongs to the objective group, allows particular illuminationparameters to be optimized, wherein other illumination parameters may belimited to predefined ranges. This permits compensation of illuminationparameter changes which are due to variations during the production ofthe components of the illumination optics or by lifetime or drifteffects. Changing the illumination parameters by way of a compensatingdisplacement of the pair of components may also be useful to compensatefor parameter changes which are due to a change in the illuminationangle distribution, in other words an illumination setting change.Likewise, this also allows compensation of illumination parameterchanges which are due to a polarization change of the illumination lightor a change in size of the object field to be exposed. Moreover, it isconceivable as well to use the compensating pair of components as a wayto design so as to ensure that demanding tolerance limits of particularillumination parameters are not exceeded. The compensating displacementof the pair of components may in particular have an impact ontelecentricity values and on the balance between illumination lightportions from various illumination directions.

In some embodiments, a displacement drive ensures an automatedcompensating displacement.

In some embodiments, a displaceability in particular allows compensationof a telecentricity. This may affect both an energetic telecentricity,in other words the intensity relationship between edge rays which areopposite to each other relative to a meridional section and illuminate afield point, as well as a geometric telecentricity, in other words aninclination of an entire radiation sub-bundle which illuminates a fieldpoint.

In some embodiments, a displacement path simplifies the construction ofthe displacement drive and has surprisingly turned out to be sufficientfor a compensating displacement in many practical applications.Likewise, a displacement path in the range of 500 μm has turned out tobe particularly advantageous for particular arrangements. Thedisplacement path may be in the range of 300 μm.

In some embodiments, a positioning accuracy is particularly well adaptedwith respect to a compensating displacement of the components. Apositioning accuracy of better than 15 μm can be preferred.

In some embodiments, a decentering displacement in particular allowsillumination angle parameters to be adapted to a size or a position ofthe object field to be illuminated.

In some embodiments, for particular arrangements, a decenteringdisplacement path in the range of 100 μm has turned out to besufficient. The decentering displacement path may be in the range of 200μm. For particular applications, positioning accuracies for thedecentering displacement path of for example up to at least 5 μm can bepreferred.

In some embodiments, a tilting displacement may in many cases serve asan alternative to a decentering displacement.

In some embodiments, the tilting displacement drive may have a tiltingdisplacement path in the range of 5 angular minutes. The tiltingdisplacement drive may have a positioning accuracy of better than 0.25angular minutes.

In some embodiments, a component selection for the displaceablecomponents results in components which are particularly sensitive to acompensation of selected illumination parameters.

In some embodiments, the same applies to a focal length/optical powerselection for the displaceable components. The displaceable component ofthe condenser group may have an absolute value of its focal length whichis smaller than 400 mm. The displaceable component of the objectiveassembly may have an absolute value of its focal length which is smallerthan 400 mm.

In some embodiments, numbers of displaceable components of the condensergroup or numbers of displaceable components of the objective group haveturned out to be sufficient for most optimization features. As a generalrule, at least one sixth of the components but no more than two sixthsof the number of these components may be displaceable at a given numberof bundle-guiding components of the condenser group. At a given numberof components of the objective group, at least one ninth of thecomponents but generally no more than two ninths of the number of thesecomponents may be displaceable.

In some embodiments, the advantages of an illumination system correspondto those describe above with reference to the illumination optics.

In some embodiments, an adjustment device in particular provides for anautomated adjustment of an illumination setting. The adjustment devicecan be connected to the control device of the compensation displacementdrive via a signal so as to ensure that a compensating displacement ofthe displaceable components of the illumination optics is actuableautomatically after changing the illumination setting.

In some embodiments, the advantages of a projection exposure apparatuscorrespond to those described above with reference to the illuminationsystem. The same applies to some embodiments of a production method andto some embodiments of a structured component.

BRIEF DESCRIPTION OF THE DRAWINGS

Embodiments of the disclosure will hereinafter be explained in moredetail with reference to the drawings, in which:

FIG. 1 shows a schematic meridional section through optical main groupsof a projection exposure apparatus for microlithography;

FIG. 2 shows a more detailed view of two of the optical main groups ofan illumination optics of the projection exposure apparatus according toFIG. 1;

FIG. 3 shows a diagram in which telecentricity values of differentillumination settings are represented as a function of an object fieldheight prior to a displacement compensation;

FIG. 4 shows a diagram similar to FIG. 3 representing the telecentricityvalues of the illumination settings after the displacement compensation;

FIG. 5 shows a total of ten diagrams representing field gradients of awavefront change, caused by a compensating displacement, as an expansionof Zernike polynomials relative to the field height;

FIGS. 6 to 8 show wavefront changes, caused by the compensatingdisplacement, at various field points;

FIGS. 9 to 11 show pupil aberrations, caused by the compensatingdisplacement, at the field points of FIGS. 6 to 8;

FIGS. 12 to 14 show pupil intensity changes, caused by the compensatingdisplacement, at the field points of FIGS. 6 to 8;

FIG. 15 shows a diagram for various annular illumination settings, thediagram representing the dependence of a geometric x-telecentricity onthe field height due to the compensating displacement;

FIG. 16 shows a diagram, similar to FIG. 15, for the various annularillumination settings, the diagram representing the dependence of auniformity on the field height due to the compensating displacement;

FIG. 17 shows a diagram, similar to FIG. 15, for the various annularillumination settings, the diagram representing the dependence of anx-pole balance on the field height due to the compensating displacement;

FIG. 18 shows a diagram, similar to FIG. 15, for the various annularillumination settings, the diagram representing the dependence of anellipticity on the field height due to the compensating displacement;

FIG. 19 shows a diagram for various x-dipole illumination settings, thediagram representing the dependence of a geometric x-telecentricity onthe field height due to the compensating displacement;

FIG. 20 shows a diagram, similar to FIG. 15, for the various x-dipoleillumination settings, the diagram representing the dependence of auniformity on the field height due to the compensating displacement;

FIG. 21 shows a diagram, similar to FIG. 15, for the various x-dipoleillumination settings, the diagram representing the dependence of anx-pole balance on the field height due to the compensating displacement;

FIG. 22 shows a diagram, similar to FIG. 15, for the various x-dipoleillumination settings, the diagram representing the dependence of atotal telecentricity on the field height due to the compensatingdisplacement;

FIGS. 23 to 26 show schematic sections through a light path of theillumination optics which is on a level with a pupil plane havingdifferently adjusted illumination settings; and

FIG. 27 shows a schematic view of a pupil of the illumination optics ofthe projection exposure apparatus including a subdivision for definingan x-pole balance.

DETAILED DESCRIPTION

FIG. 1 shows a schematic meridional section through the optical maingroups of a projection exposure apparatus 1. In this schematicillustration, the optical main groups are refractive optical elements.The optical main groups may however also be diffractive or reflectivecomponents or combinations or subcombinations ofrefractive/diffractive/reflective assemblies of optical elements.

An xyz coordinate system will hereinafter be used to facilitate thedescription of positional relationships. In FIG. 1, the x-axis extendsinto the drawing plane in a direction perpendicular to the drawingplane. The y-axis extends upwardly in FIG. 1. The z-axis extends to theright of FIG. 1 and is parallel to an optical axis 2 of the projectionexposure apparatus 1. If required, the optical axis 2 may also be foldedseveral times.

The projection exposure apparatus 1 has a radiation source 3 whichgenerates useful light in the shape of an illumination radiation bundleor imaging radiation bundle 4, respectively. The useful light 4 has awavelength which is in the deep ultraviolet range (DUV), for instance inthe range of between 100 and 20 nm. Alternatively, the wavelength ofuseful light 4 may also be in the extreme ultraviolet range (EUV), inparticular between 5 and 30 nm.

An illumination optics 5 of the projection exposure apparatus 1 guidesthe useful light 4 from the radiation source 3 to an object plane 6 ofthe projection exposure apparatus 1. An object in the form of a reticle7, which is to be imaged via the projection exposure apparatus 1, isarranged in the object plane 6. The reticle 7 is shown by dashed linesin FIG. 1. The reticle 7 is supported on a holding device (not shown)which is configured for a controlled scanning displacement or a gradualdisplacement.

The first optical main group of the illumination optics 5 is apupil-forming optics 8. The pupil-forming optics 8 serves to generate adefined intensity distribution of the useful light 4 in a downstreampupil plane 9. Furthermore, the pupil-forming optics 8 serves as anadjustment device for defining various illumination settings. Similaradjustment devices, which are for example equipped with displaceableoptical components or interchangeable stops, are known to those skilledin the art. The pupil-forming optics 8 images the radiation source 3into the pupil plane 9 in such a way that a plurality of secondary lightsources is obtained. The pupil-forming optics may additionally have afield-forming function. The pupil-forming optics 8 may be equipped withfacet elements, honeycomb elements and/or diffractive optical elements.The pupil plane 9 is optically conjugated with another pupil plane 10 ofa projection objective 11 of the projection exposure apparatus 1. Theprojection objective 11 is arranged downstream of the illuminationoptics 5 between the object plane 6 and an image plane 12. Arranged inthe image plane 12 is a wafer 13 which is shown by a dashed line inFIG. 1. The wafer 13 is supported on a holding device (not shown) whichis configured for a controlled scanning displacement or a gradualdisplacement. The projection objective 11 is used to image an objectfield 14 in the object plane 6 into an image field 14 a in the imageplane 12.

Another optical main group of the illumination optics 5 is a field lensgroup 15 that is arranged downstream of the pupil plane 9 behind thepupil-forming optics 8. Downstream of the field lens group 15 isarranged an intermediate image plane 16 which conjugated with the objectplane 6. The field lens group 15 is therefore a condenser group. A stop17 is disposed in the intermediate field plane 16 for defining an edgeboundary of the object field 14. The stop 17 is also referred to as REMA(reticle masking system for masking the reticle 7) stop.

The intermediate image plane 16 is imaged into the object plane 6 via anobjective group 18 which is also referred to as REMA lens group. Theobjective group 18 is another optical main group of the illuminationoptics 5.

FIG. 2 shows a more detailed view of the field lens group and the REMAlens group 18. The field lens group 15 includes a total of six lenseswhich are arranged in succession and are referred to as FLG1, FLG2,FLG3, FLG4, FLG5 and FLG6 according to the light path direction of theuseful light 4 when passing through the field lens group 15. The lensesFLG5 and FLG6 form a pair of lenses which replaces a meniscus lens.

A scattering plate 20 is arranged between the pupil plane 9 and the lensFLG1.

The REMA lens group 18 includes a total of nine lenses which arehereinafter referred to as REMA1, REMA2, REMA3, REMA4, REMA5, REMA6,REMA7, REMA8 and REMA9 according to the light path direction of theuseful light 4. The lenses REMA1 and REMA2 form a pair of lenses whichreplaces a meniscus lens.

Another pupil plane 19 is arranged between the lenses REMA6 and REMA7.The object plane 6 with the reticle 7 is arranged downstream of the lensREMA9 of the REMA lens group 18, which is the last lens when seen in thedirection of the rays.

The following tables show the design data of the optical assemblyaccording to FIG. 2, in other words the field lens group 15 and the REMAlens group 18. The first column of the first table shows the opticalsurfaces of the field lens group 15 and, afterwards, those of the REMAlens group 18 which are numbered from the left to the right. This willhereinafter be explained in more detail via selected surfaces. “Surface1” is the pupil plane 9. “Surfaces 2 and 3” are the entrance and exitsurfaces of the scattering plate 20. “Surfaces 4 and 5” are the entranceand exit surfaces of the lens FLG1. “Surfaces 8 and 9” are the entranceand exit surfaces of the lens FLG 3. “Surfaces 10 and 11” are theentrance and exit surfaces of the lens FLG 4. “Surfaces 12 and 13” arethe entrance and exit surfaces of the lens FLG 5. “Surfaces 16 and 17”are the entrance and exit surfaces of a gray filter upstream of theintermediate image plane 16. “Surface 18” is the intermediate imageplane 16. “Surfaces 20 and 21” are the entrance and exit surfaces of thelens REMA1. “Surfaces 22 and 23” are the entrance and exit surfaces ofthe lens REMA2. “Surfaces 34 and 35” are the entrance and exit surfacesof the lens REMA 7.

“Surfaces 40 and 41” are the entrance and exit surfaces of the lensREMA9 . “Surface 43” is an entrance surface of the reticle 7. “Surface44” is the exit surface of the reticle 7, which coincides with theobject plane 6. The column “radii” contains the curvature radii of theoptical surfaces. A radius value which is followed by the abbreviationAS indicates that the associated optical surface is an aspheric surface.The column “thicknesses” contains the distances of the optical surfacesfrom the subsequent optical surface.

The column “glasses” provides information about the lens material thatis used and about the purge gas that is contained between the opticalcomponents. The purge gas is nitrogen at atmospheric pressure.

The column “refractive index” contains the refractive indices of thelens materials and of the purge gas at a design light wavelength of193.38 nm. The column “half diameter” contains the free half diametersof the optical components.

REFRACTIVE INDEX HALF SURFACE RADII THICKNESSES GLASSES 193.38 nmDIAMETER 1 0.000000000 30.000000000 N2VP975 1.00030800 62.540 20.000000000 4.000000000 CAF2N2 1.50193400 73.459 3 0.00000000067.575962334 N2VP975 1.00030800 74.395 4 −102.282365452 19.675654616SIO2VO 1.56081000 83.343 5 −440.020481282 0.915410017 N2VP975 1.00030800114.488 6 −803.337775613 61.049379511 SIO2VO 1.56081000 121.175 7−145.821092104AS 0.878404287 N2VP975 1.00030800 128.245 8 −609.64579858460.891484394 SIO2VO 1.56081000 146.419 9 −198.062490587 0.836776312N2VP975 1.00030800 150.072 10 196.925287819 74.825300909 SIO2VO1.56081000 150.014 11 1645.165713144 0.871805701 N2VP975 1.00030800145.576 12 179.267676651AS 45.849665228 SIO2VO 1.56081000 122.904 13567.853932452 0.892941770 N2VP975 1.00030800 115.532 14 336.51039843827.208964796 SIO2VO 1.56081000 108.756 15 94.792662929 49.913447856N2VP975 1.00030800 76.124 16 0.000000000 3.050000000 SIO2VO 1.5608100071.185 17 0.000000000 36.750000000 N2VP975 1.00030800 70.394 180.000000000 20.000000000 N2VP975 1.00030800 55.626 19 0.00000000026.396909378 N2VP975 1.00030800 63.922 20 −106.710816985 11.983919597SIO2VO 1.56081000 65.539 21 3649.246336349 14.958315137 N2VP9751.00030800 84.485 22 −456.436808941 77.542056860 SIO2VO 1.5608100090.171 23 −158.779736614AS 0.962604569 N2VP975 1.00030800 115.236 24900.932620608 71.966008779 SIO2VO 1.56081000 147.006 25 −257.8897326100.968884887 N2VP975 1.00030800 149.739 26 208.306293491 62.375623603SIO2VO 1.56081000 147.051 27 994.585222840 106.008325968 N2VP9751.00030800 143.002 28 −186.450935841AS 9.980539912 SIO2VO 1.56081000113.456 29 197.217304481 124.185935998 N2VP975 1.00030800 108.722 30731.593005073 63.393462537 SIO2VO 1.56081000 141.736 31 −315.21792332849.969386933 N2VP975 1.00030800 143.489 32 0.000000000 0.000000000N2VP975 1.00030800 134.927 33 0.000000000 49.915432143 N2VP9751.00030800 134.927 34 393.832511057AS 40.103675322 SIO2VO 1.56081000150.026 35 −5462.400468456 0.000000000 N2VP975 1.00030800 150.143 360.000000000 169.289941809 N2VP975 1.00030800 150.142 37 0.000000000180.997560735 N2VP975 1.00030800 212.240 38 295.172936341 79.000000000SIO2VO 1.56081000 150.062 39 −653.730946963AS 37.517313773 N2VP9751.00030800 144.704 40 152.552362015 52.626495352 SIO2VO 1.56081000106.547 41 119.052314893 33.557963261 N2VP975 1.00030800 81.906 420.000000000 60.000000000 N2VP975 1.00030800 81.524 43 0.0000000006.300000000 SIO2VO 1.56081000 56.179 44 0.000000000 0.000000000 N2VP9751.00030800 55.335 45 0.000000000 0.000000000 N2VP975 1.00030800 55.335

The exit surface of the lens FLG 5 (“surface 7”), the entrance surfaceof the lens FLG 2 (“surface 12”), the exit surface of the lens REMA2(“surface 23”), the entrance surface of the lens REMA5 (“surface 28”),the entrance surface of the lens REMA7 (“surface 34”) and the exitsurface of the lens REMA 8 (“surface 39”) are aspheric surfacesaccording to the aspheric formulap(h)=[((1/r)h ²)/(+SQRT(1−(1+K)(1/r)² h ²))]+C1·h ⁴ +C2·h ⁶+ . . .

1/r is the curvature of the surface at the apex of the asphere. h is thedistance of a point on the optical surface of the asphere from therotational symmetry axis of the optical surface, in other words theoptical axis which extends in the z-direction. p(h), the sagittalheight, is the z-distance between a particular point, which is at adistance of h (h²=x²+y²) from the rotational symmetry axis, relative tothe apex of the optical aspheric surface, in other words the point onthe optical surface where h=0. The coefficients C3 et seq. are furthereven exponents to h starting from h⁸.

The following tables show the coefficients K as well as C1 to C9 whichneed to be substituted into the above aspheric formula in order toobtain the respective aspheric optical surface.

Aspheric Constants

SURFACE NO. 7 K −0.6575 C1 1.04920909e−008 C2 −5.71812687e−013 C31.98132786e−017 C4 6.03985545e−022 C5 0.00000000e+000 C6 0.00000000e+000C7 0.00000000e+000 C8 0.00000000e+000 C9 0.00000000e+000

SURFACE NO. 12 K 0.1370 C1 9.15826038e−009 C2 −1.74751893e−012 C33.97290883e−017 C4 −3.14687666e−021 C5 0.00000000e+000 C60.00000000e+000 C7 0.00000000e+000 C8 0.00000000e+000 C9 0.00000000e+000

SURFACE NO. 23 K −0.2784 C1 −7.44099238e−009 C2 −4.60802220e−013 C35.02597986e−018 C4 −1.79363655e−021 C5 0.00000000e+000 C60.00000000e+000 C7 0.00000000e+000 C8 0.00000000e+000 C9 0.00000000e+000

SURFACE NO. 28 K −1.3933 C1 9.49026003e−009 C2 −3.04824020e−013 C35.20968102e−017 C4 −1.43839696e−021 C5 0.00000000e+000 C60.00000000e+000 C7 0.00000000e+000 C8 0.00000000e+000 C9 0.00000000e+000

SURFACE NO. 34 K −5.1949 C1 3.25802081e−009 C2 −5.80298629e−014 C39.16229996e C4 2.54735247e−023 C5 0.00000000e+000 C6 0.00000000e+000 C70.00000000e+000 C8 0.00000000e+000 C9 0.00000000e+000

SURFACE NO. 39 K −28.1074 C1 −3.36364630e−010 C2 2.19411323e−013 C3−7.37665801e−018 C4 1.10974039e−022 C5 0.00000000e+000 C60.00000000e+000 C7 0.00000000e+000 C8 0.00000000e+000 C9 0.00000000e+000

FIG. 2 shows the paths of imaging light moving towards two field points,namely a central object field point 21 (x=0) and an object field point22 at the edge of the object field 14. The central object field point 21is arranged at the penetration point of the optical axis 2 passingthrough the object plane 6. The optical axis 2 coincides with aprincipal ray direction which is assigned to the central object fieldpoint 21. Along with the optical axis 2, the illumination light path ofthe central object field point 21 is characterized by two edge rays 23,24 which simultaneously represent the maximum illumination angles of thecentral object field point 21 and are also referred to as coma rays. Theintensity relationship of these two edge rays 23, 24 is a measure of anenergetic telecentricity of the illumination in the object field 14. Theillumination light path of the object field point 22 at the edge ischaracterized by a principal ray 25, which passes through the center ofthe objective aperture in the pupil planes 9, 19, as well as by two edgerays 26, 27 which represent the maximum illumination angle of the objectfield point 22 at the edge.

As illustrated schematically in FIG. 2, the lens FLG4 is mechanicallyconnected to a displacement drive 28. The displacement drive 28 enablesthe lens FLG4 to be displaced along the optical axis (double-headedarrow 29), in other words in the z-direction, and perpendicular to theoptical axis 2 (double-headed arrow 30). The lens FLG 4 is however notonly displaceable in the x-direction, as it is indicated by thedouble-headed arrow 30, but also in the y-direction. The displacementdrive 28 furthermore enables the lens FLG 4 to be tilted about thecenter of gravity of the lens, in other words about an axis which isperpendicular to the xz-plane (double-headed arrow 31), and about anaxis which passes through the center of gravity of the lens as well andis perpendicular to the yz-plane. By way of the displacement drive 28,the lens FLG4 is displaceable for linear translatory movement andtiltable through two degrees of freedom. In other embodiments of thedisplacement drive 28, it is conceivable as well to provide asubcombination of these degrees of freedom for displacement of the lensFLG4.

The displacement drive 28 is connected to a central control device 33 ofthe projection exposure apparatus 1 via a signal which is transmittedvia a signal line 32.

The lens FLG 5 is mechanically connected to a displacement drive 34. Asalready explained above in relation to the displacement drive 28, thedisplacement drive 34 enables the lens FLG 5 to be displaced throughthree translatory degrees of freedom and two tilting degrees of freedomas well. Corresponding double-headed arrows have the same referencenumerals in FIG. 2. The displacement drive 34 is connected to thecontrol device 33 via a signal which is transmitted via a signal line35.

The lens FLG 3 may be equipped with a corresponding displacement driveas well. This is not shown in FIG. 2.

The lens REMA1 is mechanically connected to a displacement drive 36. Asalready explained above in relation to the displacement drive 28, thedisplacement drive 36 enables the lens REMA1 to be displaced throughthree translatory degrees of freedom and two tilting degrees of freedomas well. Corresponding double-headed arrows have the same referencenumerals in FIG. 2. The displacement drive 36 is connected to thecontrol device 33 via a signal which is transmitted via a signal line37.

The lens REMA2 is mechanically connected to a displacement drive 38. Asalready explained above in relation to the displacement drive 28, thedisplacement drive 38 enables the lens REMA2 to be displaced throughthree translatory degrees of freedom and two tilting degrees of freedomas well. Corresponding double-headed arrows have the same referencenumerals in FIG. 2. The displacement drive 38 is connected to thecontrol device 33 via a signal which is transmitted via a signal line39.

The displacement drives 28, 34, 36, 38 provide a maximum displacementpath in the z-direction which is in the range of 500 μm. A displacementpath in the range of 300 μm is often sufficient. The positioningaccuracy in the z-direction is 15 μm or better. Such a positioningaccuracy of better than 15 μm ensures that a given position can bereached in the z-direction with a maximum deviation of 15 μm.

The displacement drives 28, 34, 36, 38 provide a maximum decenteringdisplacement path in the x- and y-directions which is in the range of200 μm. A decentering displacement path in the range of 100 μm is oftensufficient. The positioning accuracy in the x-direction and in they-direction is 5 μm or better.

The displacement drives 28, 34, 36, 38 provide a maximum tiltingdisplacement path about the two tilting axes which is in the range of 10angular minutes. A tilting displacement path in the range of 5 angularminutes is often sufficient. As far as the tilting movement isconcerned, the displacement drives 28, 34, 36, 38 have a positioningaccuracy of 0.25 angular minutes or better.

The two edge rays 23, 24 define a central radiation sub-bundle 40 whichbelongs to the central object field point 21. The edge rays 26 and 27define a radiation sub-bundle 41 at the edge which belongs to the objectfield point 22 at the edge.

In the lens FLG3, the two radiation sub-bundles 40, 41 overlap by nomore than 70% according to the meridional section of FIG. 2.

In the lens FLG4, the two radiation sub-bundles 40, 41 overlap by nomore than 50% according to the meridional section of FIG. 2.

In the lens FLG5, the two radiation sub-bundles 40, 41 overlap by nomore than 40% according to the meridional section of FIG. 2.

In the lens REMA1, the two radiation sub-bundles 40, 41 do not overlapat all according to the meridional section of FIG. 2; in other words,the two radiation sub-bundles 40, 41 are completely separated from oneanother in the lens REMA1.

In the lens REMA2, the two radiation sub-bundles 40, 41 overlap by nomore than 15% according to the meridional section of FIG. 2.

In the lens REMA3, the two radiation sub-bundles 40, 41 do not overlapby more than 30% according to the meridional section of FIG. 2.

The lens FLG 4 has a focal width or optical power, respectively, of 392mm. The lens FLG 5 has an optical power of 448 mm. The lens REMA1 has anoptical power of −185 mm. The lens REMA 2 has an optical power of 397mm.

The following is description, regarding FIGS. 3 and 4, of the effect ofa displacement of in each case one lens of the field lens group 15 andone lens of the REMA lens group 18 in the z-direction, in other wordsalong the optical axis 2, on a telecentricity value of the illuminationoptics 5 relative to the field height, in other words relative to thex-position in the object field 14. The central object field point 21 isarranged at the field height x=0, and the object field point 22 at theedge is arranged at the left-hand edge of the x-values according toFIGS. 3 and 4. The two z-displaceable lenses of the field lens group 15on the one hand and the REMA lens group 18 on the other may be selectedfrom the following pairs of lenses: FLG4/REMA1, FLG4/REMA 2, FLG5/REMA1, FLG5/REMA 2, which are displaceable in the z-direction via in eachcase two of the displacement drives 28, 34, 36, 38. The effect on thetelecentricity value explained by FIGS. 3 and 4 is generally alsoachievable by way of another pair of FLG/REMA lenses which is displacedin the z-direction. FIGS. 3 and 4 show telecentricity values for threedifferent illumination settings.

The following applies: t_(Ges)=t_(x)+t_(pb, x).

t_(x) (and correspondingly t_(y)) are defined as follows:

In each field point of the exposed object field is defined a centroidray of a light bundle assigned to this field point. The centroid ray hasthe energy-weighted direction of the sub-bundle of light which isemitted by this field point. Under ideal circumstances, the centroid rayof each field point is parallel to a principal ray which is defined bythe illumination optics or the projection optics, respectively.

The direction of the principal ray {right arrow over (s)}₀ (x,y) isknown from the design data of the illumination optics or the projectionoptics, respectively. The principal ray of a field point is defined bythe connection line between the field point and the center of theentrance pupil of the projection optics. The direction of the centroidray at a field point x, y in the object field of the object plane 6 isobtained as follows:

${\overset{\rightarrow}{s}\left( {x,y} \right)} = {\frac{1}{\overset{\sim}{E}\left( {x,y} \right)}{\int\;{{\mathbb{d}u}{\mathbb{d}{v\begin{pmatrix}u \\v\end{pmatrix}}}{E\left( {u,v,x,y} \right)}}}}$

E (u, v, x, y) is the energy distribution at the field point x, y as afunction of the pupil coordinates u, v, in other words as a function ofthe illumination angle which is seen by the respective field point

$x,{y.\begin{pmatrix}u \\v\end{pmatrix}}$is the unit vector of the pupil coordinates. {tilde over (E)}(x,y)=∫dudvE(u, v, x, y) is the total energy to which the point x, y isexposed.

For instance, a central object field point x₀, y₀ sees the radiation ofpartial radiation bundles from directions u, v which are defined by thepenetration point of the respective partial radiation bundle whenpassing through the pupil planes of the illumination optics 5, forinstance through the pupil plane 19. At this illumination setting, thecentroid ray s extends along the principal ray only if the differentenergies or intensities, respectively, of the partial radiation bundlecombine to form an integrated centroid ray direction which is parallelto the principal ray direction. This is only the case under idealcircumstances. In practice, there is a deviation between the centroidray direction {right arrow over (s)}(x,y) and the principal raydirection {right arrow over (s)}₀(x,y) which is referred to astelecentricity error {right arrow over (t)}(x, y):{right arrow over (t)}(x,y)={right arrow over (s)}(x,y)−{right arrowover (s)} ₀(x,y)

In the practical use of the projection exposure apparatus 1, it is notthe static telecentricity error in a particular object field to becorrected but the scan-integrated telecentricity error at x=x₀. Thistelecentricity error is obtained as follows:

${\overset{\rightarrow}{T}\left( x_{0} \right)} = {\frac{\int\;{{\mathbb{d}y}{\overset{\sim}{E}\left( {x_{0},y} \right)}{\overset{\rightarrow}{t}\left( {x_{0},y} \right)}}}{\int\;{{\mathbb{d}y}{\overset{\sim}{E}\left( {x_{0},y} \right)}}}.}$

Consequently, the telecentricity error is corrected which is integratedby a point (x, e.g. x₀) on the reticle moving through the object fieldin the object plane 5 during the scanning process, wherein a differenceis made between an x-telecentricity error (tx) and a y-telecentricityerror (ty). The y-telecentricity error is defined as a deviation of thecentroid ray from the principal ray perpendicular to the scanningdirection. The x-telecentricity error is defined as the deviation of thecentroid ray from the principal ray in the scanning direction.

t_(pb, x), which is a pole balance portion of the x-telecentricity, isdefined ast _(pb,x) =pb _(x)·NA,with NA being the numerical aperture of the useful light 4.

The definition of pb_(x), i.e. the x-pole balance, will hereinafter bedescribed by FIG. 27. FIG. 27 shows a schematic view of a free apertureof the illumination optics 5 which is on a level with a pupil plane, forinstance with the pupil plane 19, in other words the Figure shows apupil of the illumination optics 5. The pupil may be subdivided into apupil half X_(pos) for positive x-values and a pupil half X_(neg) fornegative x-values of the pupil. The intensity of the useful light 4 inthe two pupil halves X_(pos), X_(neg) is then integrated in such a waythat I(X_(pos)), I(X_(neg)) obtained. pb_(x) is then obtained asfollows:

${pb}_{x} = \frac{{{I\left( X_{pos} \right)} - {I\left( X_{neg} \right)}}}{{I\left( X_{pos} \right)} + {I\left( X_{neg} \right)}}$

FIG. 3 shows telecentricity value curves as a function of the fieldheight before a compensating displacement is carried out.

A telecentricity value curve 42 with a maximum amplitude belongs to anx-dipole setting. FIG. 23 shows a schematic view of an x-dipole settingof this type. The Figure shows a section through the light path of theuseful light 4 which is on a level with one of the pupil planes, forinstance with the pupil plane 9. This section may be subdivided intofour quadrants X₊, Y₊, X⁻ and Y⁻, depending on whether the quadrantopens into the positive x-direction, the positive y-direction, thenegative x-direction or the negative y-direction. At the x-dipolesetting, an illumination takes place exclusively from the direction oftwo illumination poles, namely from the direction of the twox-quadrants, instead of between a maximum illumination angle σ_(max) anda minimum illumination angle σ_(min).

At the x-dipole setting which produces the telecentricity value curve42, σ_(max) amounts to 0.94 times a maximum attainable illuminationangle σ₀ while σ_(min) amounts to 0.79 times σ₀. When the illuminationoptics 5 is not z-compensated, the telecentricity value curve 42 has amaximum value of +1 mrad at approximately half the field height betweenthe central object field point 21 and an object field point disposed atthe edge when seen in the positive x-direction. The telecentricity valuecurve 42 is point-symmetric with respect to the field height x=0, andtherefore has a minimum value of −1 mrad at a field height between theobject field points 21 and 22.

A telecentricity value curve 43 belongs to a y-dipole setting which isillustrated schematically in FIG. 24, which is similar to FIG. 23. Atthis y-dipole setting, an illumination also takes place exclusively inthe y-quadrants between the minimum illumination angle σ_(min) (0.79 σ₀)and the maximum illumination angle σ_(max) (0.94 σ₀). Relative to thefield height, the telecentricity value curve 43 is approximatelymirror-inverted with respect to the telecentricity value curve 42; ifthe illumination optics 5 is not z-compensated, the telecentricity valuecurve 43 has a maximum telecentricity value of 0.8 mrad at a fieldheight which lies between the central object field point 21 and theobject field point 22 at the edge and, compared to the telecentricityvalue curve 42, is closer to the object field point at the edge 22.Likewise, the telecentricity value curve 43 is also point-symmetric withrespect to the field height x=0, and therefore has a minimumtelecentricity error of approximately −0.8 mrad.

A telecentricity value curve 44 belongs to a conventional illuminationsetting which is shown by way of example in FIG. 25. At this setting,the illumination optics 5 is filled homogeneously in the pupil plane 9up to a maximum illumination angle σ_(max), c. At the conventionalillumination setting which produces the telecentricity value curve 44,σ_(max), c is 0.93 times σ₀. From a qualitative point of view, theapproximately sinusoidal shape of the telecentricity value curve 44resembles the telecentricity value curve 42 of the x-dipole setting. Amaximum telecentricity value of approximately 0.3 mrad is achieved inthe telecentricity value curve 44 at x-values which are shifted towardssmaller x-values as compared to the telecentricity value curve 42. Thetelecentricity value group 44 is point-symmetric to the field height x=0as well.

As illustrated by FIG. 4, the combined effect of a z-displacement of apair of FLG/REMA lenses, such as the pair of FLG4/REMA 1 lenses, enablesthe telecentricity values to be reduced considerably as far as theabsolute maximum values are concerned.

Due to the compensating displacement in the z-direction, thetelecentricity value curve 42 has become a telecentricity value curve 42k with a maximum telecentricity value of approximately 0.4 mrad.Compared to the telecentricity value curve 42, the maximumtelecentricity value has therefore reduced by almost a factor of 2.5.The telecentricity value curve 42 k is point-symmetric with respect tothe field height x=0 as well. The telecentricity value curve 42 k isobtained from the non-compensated telecentricity value curve 42 byaddition of a straight telecentricity value line 42 b which is directlyproportional to the field height x and is shown by a dashed line in FIG.3.

At the y-dipole setting, a compensated telecentricity value curve 43 kis obtained from the telecentricity value curve 43; after thez-compensation via the pair of FLG/REMA lenses, the curve 43 k has amaximum value of slightly less than 0.4 mrad and is stillpoint-symmetric with respect to the field height x=0. Compared to thetelecentricity value curve 43, the maximum absolute telecentricity valueof the telecentricity value curve 43 k has therefore reduced by a factorof more than 2. The telecentricity value curve 43 k is obtained from thetelecentricity value curve 43 by addition of a straight telecentricityvalue line 43 b which is also shown by a dashed line in FIG. 3 and whichis directly proportional to the field height x=0 as well.

The compensating displacement of the pair of FLG/REMA lenses in thez-direction has no impact on the telecentricity value curve 44.

The straight telecentricity value lines 42 b, 43 b are a measure of theeffect on the telecentricity when the pair of FLG/REMA lenses isz-manipulated. One of these lenses is rather sensitive to an inparticular linear x-pole balance and is therefore sensitive to an inparticular linear telecentricity portion of an x-dipole. This affectsthe geometric telecentricity. The other one of the z-manipulated lensesof the pair of FLG/REMA lenses is rather sensitive to an in particularlinear portion of the geometric telecentricity, in other words it issensitive to a y-dipole telecentricity. This affects the x-pole balance.Appropriate displacement paths for the z-displacement of in each caseone of the FLG and REMA lenses of the pair of FLG/REMA lenses permitcorrection of either the x-dipole telecentricity or the y-dipoletelecentricity. The optimum z-displacement position of the lenses of thepair of FLG/REMA lenses therefore depends on the respective illuminationsetting.

The following is a greatly simplified description of thesetting-dependent behavior of the telecentricity curves according toFIGS. 3 and 4. A contribution of one of the z-manipulated lenses of thepair of FLG/REMA lenses is such that the telecentricity value has apositive slope relative to the field height while a contribution ofanother one of these lenses is such that the telecentricity value has anegative slope relative to the field height. The relationship betweenthese two contributions can be affected by changing the amount ofz-displacement applied to in each case one of the FLG and REMA lenses ofthe pair of FLG/REMA lenses in such a way that a particular definablez-displacement of the FLG lens on the one hand and of the REMA lens onthe other ensures that the absolute telecentricity values are reduced tosmall maximum values in an optimal manner, as shown by a comparison ofFIGS. 3 and 4 in which the maximum value of +/−1 mrad of thetelecentricity value curve 42 has been reduced to a maximum value of thetelecentricity value curve 42 k of slightly greater than +/−0.4.

FIG. 5 shows how field gradients of Zernike polynomials, which serve todescribe the wavefront at a respective field point, are affected if thelens FLG4 is z-displaced by 300 μm. The Zernike polynomials Z1 . . . Z19are known, for example in the Fringe notation, from mathematical andoptical literature. FIG. 5 shows the field gradients of the Zernikepolynomials Z1, Z2, Z4, Z5 Z7, Z9, Z10, Z12, Z14, and Z19. The fieldgradients of Z1, Z4 and Z5 are influenced by the z-displacement in sucha way that a curve is produced which is point-symmetric with respect tothe field height x=0, wherein this influence rises for each fieldgradient towards positive x-values. A comparable point-symmetricbehavior with much smaller absolute values, however, can be observed forthe field gradients Z9 and Z12. The field gradients Z2 and Z27 producean approximately parabolic curve which is open upwardly. After thez-displacement of the lens FLG4, the curves of the field gradients Z10,Z14 and Z10 are mirror-symmetric with respect to x=0 as well but haveonly a small absolute field dependence.

The field gradients Z1, Z4 and Z9 have an impact on a balance betweenthe intensities delivered by the individual illumination poles of anx-dipole or a y-dipole, respectively. At the x-dipole illumination, theintensity relationship from illumination directions X₊ and X⁻ may beinfluenced by displacing the lens FLG4 in the z-direction. The sameapplies to the y-dipole illumination setting.

Likewise, the field gradients Z5 and Z12 are also assigned to a balanceof the intensity relationship between the poles of a dipole illuminationsetting, which may therefore be influenced as well by displacing thelens FLG 4 in the z-direction.

The field gradients Z2, Z7 and Z14 are assigned to a uniformity, inother words a homogeneous intensity of the field illumination. Az-displacement of the lens FLG 4 may therefore in particular have animpact on whether the field edge is illuminated with the same intensityas the center of the field.

The field gradients Z10 and Z 19 are assigned to the illuminationparameter of ellipticity. At an illumination setting in which light isemitted to the object field 14 from all of the four quadrants X₊, Y₊, X⁻and Y⁻, the z-displacement may for instance have an impact on therelationship between the intensity of the useful light which is emittedto the field points from the two X-quadrants, and the intensity which isemitted to the field points of the object field 14 from the twoy-quadrants.

When the lens FLG 4 is displaced in the z-direction by 300 μm, theillumination parameters of particular field points are affected, as willhereinafter be explained by FIGS. 6 to 14.

FIGS. 6 to 8 show the effect of the z-displacement on a wavefronthitting three different field points of the object field 14. FIG. 6illustrates the effect on the wavefront hitting the central object fieldpoint 21; FIG. 8 illustrates the effect on an object field point 45 atthe edge seen in the positive x-direction (cf. FIG. 2); and FIG. 7illustrates the effect on an object field point 46 between the objectfield points 21 and 45 (cf. FIG. 2). As expected, the z-displacement hasa rotationally-symmetric effect on the central object field point. Theeffect on the object field point 45 (cf. FIG. 8) is slightly asymmetric.

FIGS. 9 to 11 show the effect on a pupil aberration caused by thez-displacement of the lens FLG4. The central object field point (cf.FIG. 9) is affected only to a minimum extent. The object field point 46is affected in such a way that at the right-hand edge (according to FIG.10) of the pupil, there is a drift of illumination directions primarilyin the radial direction, which is illustrated by arrows in FIG. 10. Thiseffect is even increased by almost one order of magnitude at the objectfield point 45 near the edge (cf. FIG. 11).

FIGS. 12 to 14 show the effect on a pupil intensity variation of thethree field points 21, 46 and 45 caused by the z-displacement of thelens FLG4. The central object field point (cf. FIG. 9) is virtually notaffected at all. The object field point 46 (cf. FIG. 13) is affected insuch a way that there is an intensity increase across the pupil in asickle-shaped region on the right-hand side of the pupil. This effectcan be observed at the object field point 45 near the edge as well;compared to the object field point 46, it is increased, however, byalmost one order of magnitude.

FIG. 15 shows, for various conventional settings according to FIG. 25 aswell as for annular settings, how the geometric x-telecentricity acrossthe field height is affected when the lens FLG 4 is z-displaced by 300μm. An example of an annular setting is shown in FIG. 26 which issimilar to FIGS. 23 to 25. An object field point is illuminatedannularly by the pupil plane 9 with a minimum illumination angleσ_(min), a and a maximum illumination angle σ_(max), a.

FIG. 15 shows the geometric x-telecentricity (t_(x)) for a total of fourillumination settings, namely for a conventional illumination settingwith a very small maximum illumination setting of σ_(max), c of 0.2 σ₀,for a conventional setting which fills out the entire pupil of theillumination optics 5 (σ_(ma), c=1 σ₀), for an annular setting withσ_(min), a=0.65 and σ_(max), a=0.8 and for an annular illuminationsetting with σ_(min), a=0.82 and σ_(max), a=0.97. The geometricx-telecentricity is affected the most by the z-displacement of the lensFLG4 at the last mentioned annular setting with the largest illuminationangles. This is evidently obvious because the edge effects describedabove by FIGS. 6 to 14 are most apparent at this illumination setting.

FIG. 16 shows the dependence of a uniformity U on the field height forthe same four illumination settings as shown in FIG. 15.

The uniformity U is defined as follows:

${U(x)} = {100\%\frac{{I(x)} - {I\left( {x = 0} \right)}}{I\left( {x = 0} \right)}}$

In this example, the annular illumination setting with the largeillumination angles is again affected the most.

FIG. 17 illustrates, for the same four illumination settings as shown inFIG. 15, the dependence of a balance of intensities emitted by thequadrants X_(pos)/X_(neg) on the field height, in other words the x-polebalance pb_(x). This results in a curve which is mirror-inverted withrespect to the geometric x-telecentricity according to FIG. 15.

The ellipticity is another parameter for determining the quality ofillumination of the object field in the object plane 6. Thedetermination of the ellipticity helps to obtain more preciseinformation with regard to the distribution of energy or intensity,respectively, across the entrance pupil of the projection optics 11. Tothis end, the entrance pupil is divided into eight octants which arenumbered in an anticlockwise direction from O₁ to O₈, as it is commonpractice in mathematics, so that the octants O₁, O₂ are disposed in thefirst quadrant. The contribution of energy or intensity, respectively,delivered by the octants O₁ to O₈ of the entrance pupil for illuminatinga field point is hereinafter referred to as energy or intensitycontribution, respectively, I₁ to I₈.

The following quantity is referred to as HV(horizontal/vertical)-ellipticity:

$E_{HV} = {{\left( {\frac{{I\; 2} + {I\; 3} + {I\; 6} + {I7}}{{I\; 1} + {I\; 8} + {I\; 4} + {I\; 5}} - 1} \right) \cdot 100}{\%.}}$

The following quantity is referred to as ST-ellipticity:

$E_{ST} = {{\left( {\frac{{I\; 3} + {I\; 4} + {I\; 7} + {I\; 8}}{{I\; 1} + {I\; 2} + {I\; 5} + {I\; 6}} - 1} \right) \cdot 100}\%}$

According to the above description with respect to the telecentricityerror, the ellipticity may also determined for a particular object fieldpoint x₀, y₀ or for a scan-integrated illumination (x=x₀, y-integrated).

FIG. 18 illustrates, again with respect to the four illuminationsettings according to FIG. 15, the dependence of the ellipticity E_(HV)on the field height. This dependence is very small and mirror-invertedwith respect to the uniformity dependence according to FIG. 16. FIGS. 19to 22, which are similar to FIGS. 15 to 18, illustrate the effects onthe illumination parameters of geometric x-telecentricity t_(x) (FIG.19), uniformity U_((x)) (FIG. 20), x-pole balance pb_(x) (FIG. 21) aswell as a static total telecentricity t_(Ges) (FIG. 22) when the lensFLG 4 is displaced by 300 μm; this time, however, four differentx-dipole settings are observed. At a first one of these four x-dipolesettings, an illumination takes place between σ_(min)=0 and σ_(max)=0.2σ₀; in other words, light is emitted by two sectors on the tips of thequadrants X₊, X⁻. The second one of these four illumination settings issuch that the quadrants X₊, X⁻ are completely illuminated. The third oneof these illumination settings is an x-dipole illumination withσ_(min)=0.65 σ₀ and σ_(max)=0.8 σ₀. The fourth one of these x-dipoleillumination settings shows an illumination with σ_(min)=0.82 σ₀ andσ_(max)=0.97 σ₀. When the lens FLG4 is displaced in the z-direction, thelast-mentioned illumination setting, in which primarily largeillumination angles are used, has again the greatest impact on theillumination parameters shown in FIGS. 19 to 22.

The displacement compensation via a pair of FLG/REMA lenses starts offby determining an actual illumination state of the illumination optics 5via a measuring instrument. This actual illumination state is thencompared to a desired illumination state. If this difference exceeds agiven tolerance value, the lenses of the pair of FLG/REMA lenses aredisplaced in order to compensate for differences between the actualillumination state and the desired illumination state.

The effect of the z-displacement carried out during the displacementcompensation has been explained above.

Decentering a pair of FLG/REMA lenses may in particular have an impacton the telecentricity and the balance of the poles. In particular anillumination distribution across the pupil plane or across the fieldplane may be displaced in the x-direction and/or in the y-direction,which affects these illumination parameters to a corresponding degree.

A tilting displacement of one of the FLG/REMA lenses through fiveangular minutes has approximately the same effect on the illuminationparameters as a decentering displacement in the x-direction and/or they-direction by 100 μm.

The following pairs of FLG/REMA lenses have turned out to beparticularly suitable for the compensating displacement: FLG4/REMA1 andFLG5/REMA2.

Via the projection exposure apparatus 1, at least a part of the reticle7 is imaged onto a region of a light-sensitive layer on the wafer 13 forlithographic production of a microstructured or nanostructuredcomponent. Depending on whether the projection exposure apparatus 1 is ascanner or a stepper, the reticle 7 and the wafer 13 are eitherdisplaced continuously in the y-direction in a temporally synchronizedmanner (scanner) or they are displaced gradually (stepper).

Other embodiments (not shown) of the illumination optics may includeother numbers of FLG lenses or REMA lenses, in particular even highernumbers of lenses. The condenser group 15 may for instance include up toeleven components or even more components. Likewise, the objective group18 may include up to seventeen components or even more components.

What is claimed is:
 1. An illumination optics configured to illuminatean object field, the illumination optics comprising: a condenser groupcomprising optical components configured to guide a bundle of usefullight along a path, the optical components comprising a first opticalcomponent; and an objective group comprising bundle-guiding componentsarranged downstream of the condenser group in the path of useful light,the bundle-guiding components comprising a first bundle-guidingcomponent; wherein: the first optical component and the firstbundle-guiding component are displaceable to compensate deviations of anactual illumination state of the object field compared to a desiredillumination state of the object field; and the displacement of thefirst optical component and the first bundle-guiding component enhancesa first illumination parameter; a change in a second illuminationparameter due to the displacement of the first optical component and thefirst bundle-guiding component is limited within a range; the firstillumination parameter is different from the second illuminationparameter; the first illumination parameter is selected from the groupconsisting of telecentricity, a wavefront aberration, a pupilaberration, uniformity, a pole balance and ellipticity; and the secondillumination parameter is selected from the group consisting oftelecentricity, a wavefront aberration, a pupil aberration, uniformity,a pole balance and ellipticity.
 2. The illumination optics according toclaim 1, further comprising a displacement drive connected to at leastone component selected from the group consisting of the first opticalcomponent and the first bundle-guiding component.
 3. The illuminationoptics according to claim 1, wherein at least one component isdisplaceable along a principal ray direction of a central object fieldpoint, the at least one component being selected from the groupconsisting of the first optical component and the first bundle-guidingcomponent.
 4. The illumination optics according to claim 3, furthercomprising a displacement drive connected to at least one componentselected from the group consisting of the first optical component andthe first bundle-guiding component, wherein the displacement drive isconfigured to allow a displacement path in the range of one millimeteralong the principal ray direction of the central object field point. 5.The illumination optics according to claim 4, wherein the displacementdrive has a positioning accuracy of better than 50 micrometers.
 6. Theillumination optics according to claim 1, wherein at least one componentis displaceable along at least one axis which is perpendicular to aprincipal ray direction of a central object field point, and the atleast one component is selected from the group consisting of the firstoptical component and the first bundle-guiding component.
 7. Theillumination optics according to claim 6, further comprising adecentering displacement drive configured to provide a decenteringdisplacement path in the range of 400 micrometers.
 8. The illuminationoptics according to claim 7, wherein the decentering displacement drivehas a positioning accuracy of at least 20 micrometers.
 9. Theillumination optics according to claim 1, wherein at least one componentis tiltable about at least one tilting axis which is perpendicular to aprincipal ray direction of a central object field point, and the atleast one component is selected from the group consisting of the firstoptical component and the first bundle-guiding component.
 10. Theillumination optics according to claim 9, further comprising a tiltingdisplacement drive having a tilting displacement path in the range of 10angular minutes.
 11. The illumination optics according to claim 10,wherein the tilting displacement drive has a positioning accuracy ofbetter than 0.5 angular minutes.
 12. The illumination optics accordingto claim 1, wherein, during use of the illumination optics: the firstoptical component is a component in which first and second radiationsub-bundles overlap by a maximum of 70% in a meridional section whichincludes the two object field points; the first radiation sub-bundlebelongs to a central object field point; and the second radiationsub-bundle belongs to an object field point at the edge.
 13. Theillumination optics according to claim 1, wherein, during use of theillumination optics: the first bundle-guiding component is a componentin which first and second radiation sub-bundles overlap by a maximum of30% in the meridional section which includes the two object fieldpoints; the first radiation sub-bundle belongs to a central field point;and the second radiation sub-bundle belongs to an object field point atthe edge.
 14. The illumination optics according to claim 1, wherein thefirst optical component has an absolute value of its focal length whichis smaller than 450 mm.
 15. The illumination optics according to claim1, wherein the first bundle-guiding component has an absolute value ofits focal length which is smaller than 450 mm.
 16. The illuminationoptics according to claim 1, wherein the condenser group comprises atmost eleven optical components configured to guide the bundle of usefullight, and at most two of the optical components of the condenser groupare displaceable.
 17. The illumination optics according to claim 1,wherein the objective group comprises at most seventeen bundle-guidingcomponents configured to guide the bundle of useful light, and at mosttwo of the bundle-guiding components of the objective group aredisplaceable.
 18. The illumination optics according to claim 1, furthercomprising: a first displacement drive configured to displace the firstoptical component; and a second displacement drive configured todisplace the first bundle-guiding component.
 19. The illumination opticsaccording to claim 18, further comprising a control device configured tocontrol displacement of the first and second displacement drives.
 20. Asystem, comprising: a light source; and an illumination optics accordingto claim 1, wherein the system is a microlithography illuminationsystem.
 21. An apparatus, comprising: an illumination optics accordingto claim 1; and a projection objective configured to image the objectfield into an image field, wherein the apparatus is a microlithographyprojection exposure apparatus.
 22. A method, comprising: using aprojection exposure apparatus to produce structured components, theprojection exposure apparatus comprising: an illumination opticsaccording to claim 1; and a projection objective configured to image theobject field into an image field.